Sökning: "EUV Lithography"

Hittade 2 uppsatser innehållade orden EUV Lithography.

1. 1. Synchrotrons as a Source for Soft X-Ray Lithography

   Master-uppsats, Lunds universitet/Synkrotronljusfysik; Lunds universitet/Fysiska institutionen

   Författare :Thomas Joseph Grandsaert Jr; [2021]
   Nyckelord :Physics and Astronomy;

   Sammanfattning : To move to lower modes in extreme ultra-violet lithography (EUVL) technology (and keep up with Moore’s law), new sources of soft X-ray radiation must be developed. It is clear from previous studies that Free Electron Lasers (FELs) can easily meet the in-band power requirements at these lower wavelength modes, however detailed studies for insertion devices (undulators) as a soft X-ray lithography (SXL) source are due for a re-evaluation. LÄS MER

3. 2. Offline study of next generation EUV pellicle materials and performances : From experimental design to material characterization

   Master-uppsats, KTH/Skolan för elektroteknik och datavetenskap (EECS)

   Författare :Susanna Licheri; [2019]
   Nyckelord :Semiconductors; Nanotechnology; EUV Lithography; EUV Pellicle; Qualification study; Halvledare; nanoteknik; EUV litografi; EUV Pellicle; kvalificerings studie;

   Sammanfattning : Lithography is the most crucial step in the semiconductor microfabrication workflow. Continuous features size shrinking co-occurs with the reduction of the exposure wavelength: a move from 193 nm light to extreme ultra-violet (EUV) at 13.5 nm is performed. The change poses a vast number of challenges that have been overcome in the past years. LÄS MER