Sökning: "Processor"
Visar resultat 1 - 5 av 696 uppsatser innehållade ordet Processor.
1. Real-Time Certified MPC for a Nano Quadcopter
Master-uppsats, Linköpings universitet/Institutionen för systemteknikSammanfattning : There is a constant demand to use more advanced control methods in a wider field of applications. Model Predictive Control (MPC) is one such control method, based on recurrently solving an optimization problem for determining the optimal control signal. LÄS MER
2. Optimizing on-chip Machine Learning for Data Prefetching
Kandidat-uppsats, Göteborgs universitet/Institutionen för data- och informationsteknikSammanfattning : The idea behind data prefetching is to speed up program execution by predicting what data is needed by the processor, before it is actually needed. Data prefetching is commonly performed by prefetching the next memory address in line, but there are other, more sophisticated approaches such as machine learning. LÄS MER
3. Jämförelse av datakomprimeringsalgoritmer för sensordata i motorstyrenheter
M1-uppsats, KTH/Hälsoinformatik och logistikSammanfattning : Begränsad processor- och minneskapacitet är en stor utmaning för loggning avsensorsignaler i motorstyrenheter. För att kunna lagra större mängder data i dessakan komprimering användas. LÄS MER
4. RVSingle: A general purpose power efficient RISC-V for FPGAs
Master-uppsats, Linköpings universitet/Elektroniska Kretsar och SystemSammanfattning : With the increasing need for low-cost, power-efficient computing units, RISC-Vas an open-standard Instruction Set Architecture (ISA) is becoming more and more popular in the industry. There are multiple open-source RISC-V soft processors like cva6, VEGA, NOEL-V and more. LÄS MER
5. Real- and Quasi-Atomic Layer Etching for Ultra-High Resolution Patterning
Master-uppsats, Lunds universitet/Fasta tillståndets fysik; Lunds universitet/Fysiska institutionenSammanfattning : An attempt was made at developing atomic layer etching from a cyclic etching process in an ICP-RIE tool. During the process OES was used for contamination monitoring and estimation of the relative amount of Cl2 left in the chamber during the etch step of cyclic etching processes. LÄS MER