Sökning: "epitaxy"
Visar resultat 21 - 25 av 37 uppsatser innehållade ordet epitaxy.
21. Epitaxial and bulk growth of cubic silicon carbide on off-oriented 4H-silicon carbide substrates
Master-uppsats, Linköpings universitet/HalvledarmaterialSammanfattning : The growth of bulk cubic silicon carbide has for a long time seemed to be something for the future. However, in this thesis the initial steps towards bulk cubic silicon carbide have been taken. LÄS MER
22. Optical properties of free-standing cubic silicon carbide
Master-uppsats, Linköpings universitet/Halvledarmaterial; Linköpings universitet/Tekniska fakultetenSammanfattning : The properties of free-standing cubic silicon carbide for optoelectronic applications are explored in this work. The main focus of the work is on boron doped cubic silicon carbide, which is proposed as a highly useful material in several optoelectronic applications. LÄS MER
23. Development of All Dry Nanoimprint Lift-Off Process for Growth of Nanowires
Master-uppsats, Lunds universitet/Fysiska institutionen; Lunds universitet/Fasta tillståndets fysikSammanfattning : In this project, nanoimprint lithography has been applied to define gold particles on the surface of an InP wafer. For achieving this aim, a dry etching process has been developed to create resist undercut for the lift-off. LÄS MER
24. Processing Technology for Si Based Tandem Solar Cells
Master-uppsats, KTH/Skolan för informations- och kommunikationsteknik (ICT)Sammanfattning : This project focuses on the investigation of Silicon based Tandem solar cell fabricated by using the Hydride Vapor Phase Epitaxy (HVPE). In the state-of-the-art multi-junction solar cell manufacturing epitaxial technologies are used for sub-cell formation, such as MOVPE (Metal Organic Vapour Phase Epitaxy) [1] or MBE (Molecular Beam Epitaxy) [2]. LÄS MER
25. Characterization of SiGe layers grown by Trisilane and Germane at low temperatures for BiCMOS application
Master-uppsats, KTH/Skolan för informations- och kommunikationsteknik (ICT)Sammanfattning : Low temperature epitaxy (LTE) of SiGe by chemical vapor deposition (CVD) has attracted dramatic attention during the last decade for CMOS and BiCMOS application. LTE relates to a temperature range of 350÷650 °C. LÄS MER