Sökning: "Thin film characterization"
Visar resultat 1 - 5 av 42 uppsatser innehållade orden Thin film characterization.
1. Crystallinity of Sputtered TiO2 Thin Films: a Study of the Heating and Plasma Influence on the Growth
Master-uppsats,Sammanfattning : AbstractHigh-Power Impulse Magnetron Sputtering (HIPIMS) of TiO2 thin films enhances their photocatalyticproperties compared to the films prepared by standard sputtering methods, especially when no substrateheating is employed. With no heating, the coatings present an amorphous structure that benefits from theionization of the sputtered flux granted by HiPIMS, with respect to their photocatalytic performance. LÄS MER
2. Heteroepitaxial Growth of GaN Film on Si substrate by Magnetron Sputtering
Master-uppsats, Linköpings universitet/Institutionen för fysik, kemi och biologiSammanfattning : In this study, the effect of AlN buffer layer structure and morphology on the GaN films deposited on Si (111) substrate by reactive DC magnetron sputtering have been studied. For structural and morphological characterization X-ray diffraction (XRD) and Scanning electron microscope (SEM) were used. LÄS MER
3. Improving polarizing neutron optics by introducing 11B4C as interlayers
Master-uppsats, Linköpings universitet/TunnfilmsfysikSammanfattning : In this report, the effects of adding 11B4C as interlayers into Fe/Si multilayers is studied. Fe/Si multilayers are commonly used for neutron polarization at large research facilities, and improving the polarizing properties would improve their efficiency. LÄS MER
4. Processing techniques of perovskite solar cells : Properties depending on material and manufacturing
Kandidat-uppsats, Uppsala universitet/Fysikalisk kemiSammanfattning : This project investigates how different types of perovskite solar cells, differentiated by choice of materials and processing techniques, compares to each other regarding performance and characterization. The purpose of the project is to further develop perovskite solar cells and to improve the method of manufacturing for better performance. LÄS MER
5. Flashlamp Annealing for Improved Ferroelectric Junctions
Master-uppsats, Lunds universitet/Fysiska institutionen; Lunds universitet/Institutionen för elektro- och informationsteknikSammanfattning : The effects of flashlamp annealing (FLA) on the quality of ferroelectric HfxZr1–xO2 (HZO) interfaces, integrated on InAs substrates, are evaluated. For the integration of ferroelectric HZO on III-V semiconductors the crystallization via rapid thermal processing (RTP) can severely degrade the HZO/III-V interface. LÄS MER