Sökning: "Chemical Mechanical Polishing"

Hittade 5 uppsatser innehållade orden Chemical Mechanical Polishing.

  1. 1. Chemical Mechanical Polishing of InSb

    Master-uppsats, Lunds universitet/Institutionen för elektro- och informationsteknik

    Författare :David Linehan; [2021]
    Nyckelord :CMP; InSb; Chemical Mechanical Polishing; Indium; Antimonide; AFM; Profilometer; Ultrasonic; PVA; Smooth; Rough; Etch; Planarization; Technology and Engineering;

    Sammanfattning : .... LÄS MER

  3. 2. Evaluation of Chemical Mechanical Planarization Capability of Titan™ Wafer Carrier on Silicon Oxide

    Master-uppsats, KTH/Skolan för informations- och kommunikationsteknik (ICT)

    Författare :Raul Molines Colomer; [2017]
    Nyckelord :;

    Sammanfattning : Chemical mechanical polishing (CMP) has emerged as a critical technique for the manufacture of complex integrated circuits to achieve low surface roughness and high degree of planarization. In particular, the continuous progression of the wafer carrier has been driven by the interest of diminishing the waste on a wafer by reducing the edge of exclusion area, and hence, increasing the amount of chips per wafer. LÄS MER

  4. 3. Optimizing Transmission Kikuchi Diffraction for Analysing Grain Size and Orientation of Nanocrystalline Coatings

    Uppsats för yrkesexamina på avancerad nivå, Uppsala universitet/Tillämpad materialvetenskap

    Författare :Axel Tryblom; [2015]
    Nyckelord :TKD; t-EBSD; Kikuchi diffraction; coating; nanocrystalline; sample preparation; in situ lift-out; DualBeam; precision mechanical polishing; SEM;

    Sammanfattning : In order to increase efficiency and lifetime of cutting tools it is typical to apply thin coatings by physical or chemical vapour deposition. Applying coatings on cutting tools has shown an increase in both efficiency and lifetime and are of large interest in further development. LÄS MER

  5. 4. InP/Si Template for Photonic Application

    Master-uppsats, KTH/Skolan för informations- och kommunikationsteknik (ICT)

    Författare :Niklas Larsson; [2015]
    Nyckelord :CELOG; CMP; Chemlox; Citric Acid; Sodium Hypochlorite; InP; CELOG; CMP; Chemlox; Citronsyra; Natrium Hypoklorit; InP;

    Sammanfattning : In this work an epitaxial layer of Indium Phosphide (InP) has been grown on top of a silicon substrate using the Corrugated Epitaxial Lateral Overgrowth (CELOG) technique. The grown InP CELOG top layer typically has a poor surface roughness and planarity. Before this surface can be used for any processing it has to be smooth and planarized. LÄS MER

  7. 5. Surface Optimization of the Silicon Templates for Monolithic Photonics Integration

    Master-uppsats, KTH/Skolan för informations- och kommunikationsteknik (ICT)

    Författare :Chen Hu; [2011]
    Nyckelord :Chemical mechanical polishing; epitaxial lateral growth; surface optimization; roughness; surface morphology; step height; surface topography.;

    Sammanfattning : Silicon photonics is emerging as a potential field to achieve optical interconnects towards the realization of ultra high bandwidth. The indirect band-gap property of silicon still remains as a big challenge to incorporate silicon photonic active device, for example, silicon-based laser. LÄS MER