Block copolymer-based hybrid nanomaterials for nanoimprint applications

Sammanfattning: In this Master’s thesis project, a block copolymer (BCP) film was used in combination with sequential infiltration synthesis and etching to manufacture a nanoimprint lithography stamp consisting of silicon. The BCP film was designed to contain perpendicularly aligned hexagonally placed cylinders, a pattern that will later be investigated for antibacterial properties after being transferred via nanoimprint lithography to a polymer film. To facilitate satisfactory pattern transfer from the BCP film into the silicon, optimisation of the infiltration conditions were made. During this process, thermal annealing was observed to induce self-assembly of the BCP PS-b-P4VP into perpendicularly aligned cylinders that were locally hexagonally placed. The nanoimprint lithography stamp was found to achieve the transfer of the cylindrical pattern into a polymer film that will later be evaluated for its antibacterial properties.