Sökning: "Thin film"
Visar resultat 6 - 10 av 252 uppsatser innehållade orden Thin film.
6. Crystallinity of Sputtered TiO2 Thin Films: a Study of the Heating and Plasma Influence on the Growth
Master-uppsats,Sammanfattning : AbstractHigh-Power Impulse Magnetron Sputtering (HIPIMS) of TiO2 thin films enhances their photocatalyticproperties compared to the films prepared by standard sputtering methods, especially when no substrateheating is employed. With no heating, the coatings present an amorphous structure that benefits from theionization of the sputtered flux granted by HiPIMS, with respect to their photocatalytic performance. LÄS MER
7. Photoluminescence Mapping of Erbium Doped Lithium Niobate
Master-uppsats, KTH/Tillämpad fysikSammanfattning : Lithium niobate (LiNbO3) is a human-made crystalline which is widely used in modern photonics due to its useful properties. In recent years, there has been significant progress in the development of lithium niobate on insulator (LNOI) technology, realizing a fully functional photonic integrated circuits, thanks to its capabilities in both electro-optics and second-order optical nonlinearity. LÄS MER
8. (1,3-di-tert-butyltriazenide) Cu(I) as vapor deposition precursor
Kandidat-uppsats, Linköpings universitet/KemiSammanfattning : In the past few decades, devices such as computers have become smaller, and their performance has improved beyond comparison. Semiconductors and interconnectors are used in almost all devices today and are made of thin films. LÄS MER
9. The effect of material properties on PEM fuel cell catalysts on durable oxidation reduction activity
Master-uppsats, KTH/KemiteknikSammanfattning : I detta examensarbete utforskas påverkan av partikelstorleken hos Pt-katalysatorer på kolbärare på syrereduktionen i polymerelektrolytmembran (PEM)-bränsleceller. Den elektrokemiskt aktiva ytarean, aktiviteten för syrereduktion och tillhörande degraderingshastigheter för de undersökta katalysatorerna beräknas och jämförs. LÄS MER
10. A Quantum Chemical Investigation of Chemical Vapour Deposition of Fe using Ferrocene and Plasma Electrons
Master-uppsats, Linköpings universitet/KemiSammanfattning : Thin films provide a remarkable asset, as depositing a thin surface layer can completely alter a material’s characteristics and provide new, inexpensive, and valuable properties. In 2020, a new Chemical Vapour Deposition (CVD) approach was developed at Linköping University, using plasma electrons as reducing agents for the deposition of metallic thin films. LÄS MER