Sökning: "epitaxy"
Visar resultat 16 - 20 av 37 uppsatser innehållade ordet epitaxy.
16. Fabrication and characterization of gate last Si MOSFETs with SiGe source and drain
Master-uppsats, KTH/Skolan för informations- och kommunikationsteknik (ICT)Sammanfattning : The continuous evolution of digital technology we enjoy today is the result of ever shrinking, faster and cheaper transistors that make up the ubiquitous integrated circuits of our devices. Over the decades, the industry has gone from purely geometrical scaling to innovative solutions like high-k dielectrics combined with metal gates and FinFETs. LÄS MER
17. Epitaxial growth and processing of high-aspect ratio InGaAs fins for advanced MOSFETs
Master-uppsats, Lunds universitet/Fysiska institutionen; Lunds universitet/Fasta tillståndets fysikSammanfattning : In this thesis, InGaAs fins with vertical sidewalls consisting of {110} facets were epitaxially grown on InP(111)B substrates using metalorganic vapor phase epitaxy. A lithography patterned hydrogen silsesquixane growth mask was used to promote the formation of vertical {110} facets during the growth. LÄS MER
18. Electrical characterization of strained InP-Ga(x)In(1-x)As core-shell nanowires
Magister-uppsats, Lunds universitet/Fysiska institutionen; Lunds universitet/Fasta tillståndets fysikSammanfattning : This project report attempts to measure the piezoelectric effect in strained core-shell nanowires. The core material is wurtzite indium phosphide (InP) and the shell material wurtzite gallium indium arsenide (Ga(x)In(1-x)As). LÄS MER
19. Development of Epitaxial Lift-Off to form GaAs nanowire array membranes
Master-uppsats, Lunds universitet/Fasta tillståndets fysik; Lunds universitet/Fysiska institutionenSammanfattning : Epitaxial lift-off-layers (ELO) were developed in order to create nanowire array membranes, with the intent to pave the way for solar cells in tandem. Ultimately this thesis project focused only on growing and characterizing the ELO layers on (111)B oriented GaAs substrates with MOCVD, as this process step is not thoroughly understood in literature. LÄS MER
20. Properties of III-V semiconductor materials grown by HVPE
Master-uppsats, KTH/Skolan för informations- och kommunikationsteknik (ICT)Sammanfattning : This thesis focuses on the characterization of lll-V semiconductor materials by using Scanning Electron Microscopy equipped with Energy Dispersive Spectroscopy (SEM-EDS), High Resolution X-ray Diffraction (HRXRD), Atomic Force Microscopy (AFM) and Photoluminescence (PL). In XRD characterization, the rocking curve measurement was conducted to evaluate the composition of III-V semiconductor alloys and the Reciprocal Lattice Mapping (RLM) revealed the detailed structural properties of heteroepitaxial III-V semiconductors. LÄS MER