Sökning: "Litografi"

Visar resultat 1 - 5 av 8 uppsatser innehållade ordet Litografi.

  1. 1. Grafik som folkbildning : En analys av litografins spridning i det svenska folkhemmet 1947-1957

    Master-uppsats, Södertörns högskola/Institutionen för kultur och lärande

    Författare :Catarina Drugge; [2023]
    Nyckelord :Graphics; Graphic Art; litography; democracy; public education; Pierre Bourdieu; sociology; public home; Konstfrämjandet; Grafik; litografi; folkbildning; Pierre Bourdieu; folkhemmet; kulturpolitik; konstföreningar; Konstfrämjandet;

    Sammanfattning : Graphic Art as Public Education – a Study of the Spreading of Litographic Prints in Swedish Homes 1947-1957  This thesis aims to analyze how graphics as an art form became a tool to democratize art during the period of 1947–1957 in Sweden. Graphic art refers to the collective term that includes multiplied art prints: lithography, etching, woodcut, and serigraphy. LÄS MER

  3. 2. Inductively-Coupled Plasma Etching for Nanoimprint Si-masters

    Master-uppsats, Lunds universitet/Fasta tillståndets fysik; Lunds universitet/Fysiska institutionen

    Författare :Oskar Boström; [2019]
    Nyckelord :NIL; Semiconductor; EBL; SEM; ICP-RIE; Fluorine Etching; Physics; Technology and Engineering;

    Sammanfattning : In the last decades, engineers have been pushing semiconductor technology towards fabricating ever smaller devices, and will eventually pass the lower limit of currently commonplace optical lithographic techniques. New techniques have been developed, such as nanoimprint lithography. LÄS MER

  4. 3. Study of ohmic contact formation on AlGaN/GaN heterostructures

    Master-uppsats, KTH/Skolan för elektroteknik och datavetenskap (EECS)

    Författare :Kai-Hsin Wen; [2019]
    Nyckelord :ohmic contacts; wide bandgap; Ta-based; recess etch; N-vacancies;

    Sammanfattning : It is challenging to achieve low-resistive ohmic contacts to III-nitride semiconductors due to their wide bandgap. A common way to reduce the contact resistance is to recess the ohmic area prior to metallization. LÄS MER

  5. 4. Offline study of next generation EUV pellicle materials and performances : From experimental design to material characterization

    Master-uppsats, KTH/Skolan för elektroteknik och datavetenskap (EECS)

    Författare :Susanna Licheri; [2019]
    Nyckelord :Semiconductors; Nanotechnology; EUV Lithography; EUV Pellicle; Qualification study; Halvledare; nanoteknik; EUV litografi; EUV Pellicle; kvalificerings studie;

    Sammanfattning : Lithography is the most crucial step in the semiconductor microfabrication workflow. Continuous features size shrinking co-occurs with the reduction of the exposure wavelength: a move from 193 nm light to extreme ultra-violet (EUV) at 13.5 nm is performed. The change poses a vast number of challenges that have been overcome in the past years. LÄS MER

  7. 5. Automation of the design process of printed circuit boards : Determining minimum distance required by auto-routing software

    Uppsats för yrkesexamina på grundnivå, KTH/Skolan för elektroteknik och datavetenskap (EECS)

    Författare :Simon Ström; Ali Qhorbani; [2018]
    Nyckelord :Printed circuit board; Industry 4.0; Lithography; Auto-routing; Minimum distance; Estimation; Mönsterkort; Industri 4.0; Litografi; Auto-routing; minsta avstånd; uppskattning;

    Sammanfattning : This thesis project aims to create an overview of new technologies in printed circuit board manufacturing which when automated could become part of an Industry 4.0 production flow. Potential design limits imposed by new technologies are then applied in the creation process of a minimum distance estimation function. LÄS MER